Optical emission spectroscopy from rf sputtering plasma of Gd-Co alloy.
نویسندگان
چکیده
منابع مشابه
Characterization of a-C:H:N deposition from CH4/N2 rf plasmas using optical emission spectroscopy
Optical emission spectra ~OES! from CH4/N2 rf plasmas, which are used for the deposition of nitrogen-containing hydrogenated amorphous carbon ~a-C:H:N! thin films, have been characterized. Previously unidentified spectral lines have been assigned to atomic N. Further identified species include CH, H, H2, N2, N2 1 , N, and CN. Variations between spectra from the pure CH4 or N2 plasmas and the mi...
متن کاملStudy of Plasma System by OES (Optical Emission Spectroscopy)
Low-temperature and low-pressure plasma was investigated by OES (optical emission spectroscopy) in the range 200–1100 nm. For displaying measured emission spectra and identification of spectrum lines the software Spectrum Analyzer was used. Two modes of glow discharge present in the DC cylindrical magnetron apparatus which were previously researched by a mass spectrometer were studied by OES. T...
متن کاملTime-resolved optical emission spectroscopy of laser-produced air plasma
Related Articles Nonmonotonic radial distribution of excited atoms in a positive column of pulsed direct currect discharges in helium Appl. Phys. Lett. 102, 034104 (2013) Iterative Boltzmann plot method for temperature and pressure determination in a xenon high pressure discharge lamp J. Appl. Phys. 113, 043303 (2013) Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasm...
متن کاملA STUDY OF TiAlN COATINGS PREPARED BY RF CO-SPUTTERING
Using the reactive magnetron rf co-sputtering technique and a Ti target partially covered with a small Al plate, TiAlN coatings were made on c-Si in a reactive atmosphere of nitrogen and argon. Coatings were deposited on substrates at 22°C and at 150°C. The substrate temperature notably affected the thickness, crystalline grain size, and hardness of the coatings. We analyzed the dependence of b...
متن کاملThe effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films
In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Magnetics Society of Japan
سال: 1988
ISSN: 0285-0192
DOI: 10.3379/jmsjmag.12.203